Transistor Performance Research Articles

Performance enhancement of 2D tin-halide perovskite transistors via molecule-assisted grain boundary passivation and hole doping

Tin (Sn2+)-based halide perovskites have garnered considerable interest for potential applications in field-effect transistors, owing to their low-cost solution processing capability and favorable hole transport properties. However, the polycrystalline nature of halide perovskite films necessitates efficient grain boundary passivation for reliable and stable device operation. Additionally, as a p-type semiconductor, controllable hole-doping is desired for modulating electrical properties. In this study, we demonstrate the dual functionality of doping the small molecule tetrafluoro-tetracyanoquinodimethane (F4TCNQ) into (C6H5C2H4NH3)2SnI4 (abbreviated as (PEA)2SnI4) through a cost-effective solution process. This doping introduces F4TCNQ as both a grain boundary passivator and a charge transfer p-dopant, resulting in effective improvements in transistor performance with a 6-fold enhancement in mobility, a substantial reduction in hysteresis, an enhanced current ratio, and improved stabilities.

Ferroelectric Based Low Power MOSFET for DC/RF Applications: Machine Learning Assisted Statistical Variation Analysis

Abstract The analog/radio-frequency (RF) performance of a ferroelectric-based substrate metal oxide semiconductor field effect transistor (FE-MOSFET) with dielectric spacer was designed and proposed. The utilization of gate side wall spacers aims to mitigate short-channel effects (SCEs), and improve overall device performance. Simulation results demonstrate enhanced performance metrics, including improved transconductance (80%), reduced gate leakage (95.4%), and enhanced cutoff frequency (25%), making this design a promising candidate for next-generation high-performance analog and RF applications. Additionally, a novel machine learning (ML)-assisted approach is proposed for investigating the spacer-based FE-MOSFET to reduce the computational cost of numerical TCAD device simulations with the help of conventional- artificial neural network (C-ANN). This method is reported for the first-time ML-based C-ANN for Fe-based low-power MOSFET, matches the similar accuracy of physics-based TCAD with the fastest learning rate and fastest computational speed (in 95-100 seconds). An ML-based prediction replacement for physics-based TCAD is developed to save around 8-10 hours of runtime for each iteration. Because ML predictions can never be 100% accurate, it is essential to ensure approximately zero mean-square error in the final results.

Copper(I) Iodide Thin Films: Deposition Methods and Hole-Transporting Performance

The pursuit of p-type semiconductors has garnered considerable attention in academia and industry. Among the potential candidates, copper iodide (CuI) stands out as a highly promising p-type material due to its conductivity, cost-effectiveness, and low environmental impact. CuI can be employed to create thin films with >80% transparency within the visible range (400–750 nm) and utilizing various low-temperature, scalable deposition techniques. This review summarizes the deposition techniques for CuI as a hole-transport material and their performance in perovskite solar cells, thin-film transistors, and light-emitting diodes using diverse processing methods. The preparation methods of making thin films are divided into two categories: wet and neat methods. The advancements in CuI as a hole-transporting material and interface engineering techniques hold promising implications for the continued development of such devices.

High-Performance Contact-Doped WSe2 Transistors Using TaSe2 Electrodes.

Two-dimensional (2D) transitional metal dichalcogenides (TMDs) have garnered significant attention due to their potential for next-generation electronics, which require device scaling. However, the performance of TMD-based field-effect transistors (FETs) is greatly limited by the contact resistance. This study develops an effective strategy to optimize the contact resistance of WSe2 FETs by combining contact doping and 2D metallic electrode materials. The contact regions were doped using a laser, and the metallic TaSe2 flakes were stacked on doped WSe2 as electrodes. Doping the contact areas decreases the depletion width, while introducing the TaSe2 contact results in a lower Schottky barrier. This method significantly improves the electrical performance of the WSe2 FETs. The doped WSe2/TaSe2 contact exhibits an ultralow Schottky barrier height of 65 meV and a contact resistance of 11 kΩ·μm, which is a 50-fold reduction compared to the conventional Cr/Au contact. Our method offers a way on fabricating high-performance 2D FETs.

Poling induced changes in polarization domain structure of polymer ferroelectrics for application in organic thin film transistors

While electrical poling of organic ferroelectrics has been shown to improve device properties, there are challenges in visualizing accompanying structural changes. We observe poling induced changes in ferroelectric domains by applying differential phase contrast (DPC) imaging in the scanning transmission electron microscope, a method that has been used to observe spatial distributions of electromagnetic fields at the atomic scale. In this work, we obtain DPC images from unpoled and electrically poled polyvinylidene fluoride trifluorethylene films and compare their performance in polymer thin film transistors. The vertically poled films show uniform domains throughout the bulk compared to the unpoled film with a significantly higher magnitude of the overall polarization. Thin film transistors comprising a donor–acceptor copolymer as the active semiconductor layer show improved performance with the vertically poled ferroelectric dielectric film compared with the unpoled ferroelectric dielectric film. A poling field of 80–100 MV/m for the dielectric layer yields the best performing transistors; higher than 100 MV/m is seen to degrade the transistor performance. The results are consistent with a reduction in deleterious charge carrier scattering from ferroelectric domain boundaries or interfacial dipoles arising from electrical poling.

A Reliability Investigation of VDMOS Transistors: Performance and Degradation Caused by Bias Temperature Stress

This study aimed to comprehensively understand the performance and degradation of both p- and n-channel vertical double diffused MOS (VDMOS) transistors under bias temperature stress. Conducted experimental investigations involved various stress conditions and annealing processes to analyze the impacts of BT stress on the formation of oxide trapped charge and interface traps, leading to threshold voltage shifts. Findings revealed meaningful threshold voltage shifts in both PMOS and NMOS devices due to stresses, and the subsequent annealing process was analyzed in detail. The study also examined the influence of stress history on self-heating behavior under real operating conditions. Additionally, the study elucidated the complex correlation between stress-induced degradation and device reliability. The insights contribute to optimizing the performance and permanence of VDMOS transistors in practical applications, advancing semiconductor technology. This study underscored the importance of considering stress-induced effects on device reliability and performance in the design and application of VDMOS transistors.

Enhancing Stability and Performance in Tin-Based Perovskite Field-Effect Transistors Through Hydrogen Bond Suppression of Organic Cation Migration.

Ion migration poses a substantial challenge in perovskite transistors, exerting detrimental effects on hysteresis and operational stability. This study focuses on elucidating the influence of ion migration on the performance of tin-based perovskite field-effect transistors (FETs). It is revealed that the high background carrier density in FASnI3 FETs arises not only from the oxidation of Sn2+ but also from the migration of FA+ ions. The formation of hydrogen bonding between FA+ and F- ions efficiently inhibits ion migration, leading to a reduction in background carrier density and an improvement in the operational stability of the transistors. The strategy of hydrogen bond is extended to fluorine-substituted additives to improve device performance. The incorporation of 4-fluorophenethylammonium iodide additives into FETs significantly minimizes the shift of turn-on voltage during cyclic measurements. Notably, an effective mobility of up to 30 cm2 V-1 s-1 with an Ion/off ratio of 107 is achieved. These findings hold promising potential for advancing tin-based perovskite technology in the field of electronics.

Application of Silicon Nanowires

Abstract:: Silicon Nanowires (SiNWs), a novel category of nanomaterials, exhibit several outstanding properties, including superior transistor performance, quantum tunneling effects, and remarkable electrical and optical capabilities. These properties are expected to contribute significantly to the development of future nanodevices, such as sensors and optoelectronic components. The potential for device miniaturization with SiNWs is based on their ease of monocrystallization. This leads to a reduced rate of hole-electron complexes and their extensive specific surface area that promotes boundary effects, thereby diminishing conductivity. Characterized by unique structural attributes, SiNWs hold promise for a wide range of applications in various sectors. To date, multiple methods have been established for SiNW fabrication, including solgel, electrochemical, laser ablation, chemical vapor deposition, and thermal vapor deposition techniques. Subsequently, the focus has shifted to the application of SiNWs in electronics, energy, and biomedicine. SiNWs are instrumental in producing high-performance electronic devices, such as field-effect transistors, sensors, and memory units. They also exhibit outstanding photovoltaic properties, making them suitable for high-efficiency solar cell and photocatalyst production. Additionally, SiNWs are poised to make significant contributions to biomedicine, particularly in biosensors, drug delivery systems, and tissue engineering materials. This article provides a concise review of the current status of SiNWs in electronics, sensing devices, and solar cell applications, and their roles in high-performance transistors, biosensors, and solar cells. It concludes with an exploration of the challenges and prospects for SiNWs. In summary, the unique attributes of SiNWs establish them as a versatile nanomaterial with broad applicability. This review offers a comprehensive overview of SiNW research and theoretical insights that may guide similar studies. The insights into recent SiNW research presented here are intended to inform future applications and investigations involving these nanomaterials.

Optimizing SOI-MESFET transistor performance at high frequencies by air-oxide layers in the channel and a nickel layer in the box

In this paper, we introduce a new transistor structure that has improved alternating current and direct current parameters compared to the basic structure. The cutoff frequency of the proposed structure is 33 GHz, while the cutoff frequency of the basic structure is 25.5 GHz. One important improvement is that the gate-drain parasitic capacitors in the channel area are nearly zero, thanks to the presence of an air layer between the gate and source electrodes and a nickle layer in the burried oxide. In addition to the alternating current parameters, the direct current parameters have also been strengthened. The maximum output power density for the new structure is 1.08 W/mm, compared to 0.455 W/mm for the normal structure. Furthermore, the breakdown voltage in the new structure has increased to 30 V, while the basic structure has a breakdown voltage of 16 V. These improvements are attributed to the transfer of the gate to the source and the increased distance from the drain region, as well as the presence of two layers of oxide and air on both sides of the gate. Consequently, the new structure can effectively operate at high voltages and powers.

0.5 V Multiple-Input Fully Differential Operational Transconductance Amplifier and Its Application to a Fifth-Order Chebyshev Low-Pass Filter for Bio-Signal Processing.

This paper presents a multiple-input fully differential operational transconductance amplifier (MI-FD OTA) with very low power consumption. To obtain a differential MOS pair with minimum supply voltage and minimum power consumption, the multiple-input bulk-driven MOS transistor operating in the subthreshold region is used. To show the advantage of the MI-FD OTA, a fifth-order Chebyshev filter was used to realize a low-pass filter capable of operating with a supply voltage of 0.5 V and consuming 60 nW at a nominal setup current of 3 nA. The proposed filter uses five MI-FD OTAs and five capacitors. The total harmonic distortion (THD) was 0.97% for a rail-to-rail sinusoidal input signal. The MI-FD OTA and the filter application were designed and simulated in the Cadence environment using a 0.18 µm CMOS process from TSMC. The robustness of the design was confirmed by Monte Carlo analysis and process, voltage, and temperature corner analysis.

Quantum interference enhances the performance of single-molecule transistors.

Quantum effects in nanoscale electronic devices promise to lead to new types of functionality not achievable using classical electronic components. However, quantum behaviour also presents an unresolved challenge facing electronics at the few-nanometre scale: resistive channels start leaking owing to quantum tunnelling. This affects the performance of nanoscale transistors, with direct source-drain tunnelling degrading switching ratios and subthreshold swings, and ultimately limiting operating frequency due to increased static power dissipation. The usual strategy to mitigate quantum effects has been to increase device complexity, but theory shows that if quantum effects can be exploited in molecular-scale electronics, this could provide a route to lower energy consumption and boost device performance. Here we demonstrate these effects experimentally, showing how the performance of molecular transistors is improved when the resistive channel contains two destructively interfering waves. We use a zinc-porphyrin coupled to graphene electrodes in a three-terminal transistor to demonstrate a >104 conductance-switching ratio, a subthreshold swing at the thermionic limit, a >7 kHz operating frequency and stability over >105 cycles. We fully map the anti-resonance interference features in conductance, reproduce the behaviour by density functional theory calculations and trace back the high performance to the coupling between molecular orbitals and graphene edge states. These results demonstrate how the quantum nature of electron transmission at the nanoscale can enhance, rather than degrade, device performance, and highlight directions for future development of miniaturized electronics.

Evaluating the performance of p-type organic field-effect transistor using different source–drain electrodes

Evaluating the performance of p-type organic field-effect transistor using different source–drain electrodes

Enhanced performance in doped micro-nano porous organic thin-film transistors

Molecular doping, as an effective technique for controlling the electrical property of organic semiconductors (OSCs) by introducing additional charges, has been proven to adjust important device parameters in organic thin-film transistors (OTFTs). Doping highly crystalline OSCs without disrupting structural order is a crucial challenge, as it significantly affects the charge carrier mobility. Here, we demonstrate a molecular doping method without disrupting the molecular ordering to improve the charge carrier mobility of 2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene (C8-BTBT) based OTFTs via a simple thermal spin-coating method. The key is to introduce micro-nano pores into C8-BTBT thin-film for channel doping, which is achieved by mixing with the unsubstituted BTBT as it can be easily removed from the thin-film through an ordinary annealing process. Micro-nano pores allow the dopant molecules (2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane, F4-TCNQ) to access the conductive channel of OTFT, which is beneficial for charge injection. Indeed, we further discover that F4-TCNQ doped porous C8-BTBT thin-films exhibit better charge mobility than those of neat and F4-TCNQ doped C8-BTBT films in OTFTs. This work proposes an effective way to expose OSC conjugated core to the dopant, which not only improves the charge transfer reaction between organic/dopant semiconductor through cofacial stacking, but also reduces the trap density and contact resistance.

Cation doping strategy for improved carrier mobility and stability in metal-oxide Heterojunction thin-film transistors

The heterojunction channel architecture has emerged as a viable solution to enhance the performance of metal-oxide thin-film transistors (TFTs), addressing the performance limitations of single-channel counterparts. However, carrier mobility enhancement through a channel thickness design often encounters significant challenges such as the negative threshold voltage (Vth) shift. In this study, we present a cation doping strategy, designed to regulate Vth shift while simultaneously boosting carrier mobility in zinc-tin-oxide (ZTO)-based heterojunction TFTs. A comprehensive investigation of ZTO-based semiconductors was conducted to explore the impact of cation doping on the energy band structure and to find an optimal heterojunction channel structure for high carrier mobility and stability. The resulting ZTO/Ti-doped ZTO (Ti:ZTO) heterojunction TFTs demonstrated a field-effect mobility of 39.7 cm2/Vs, surpassing the performance of ZTO TFTs (16.1 cm2/Vs), with a minimal change in the Vth. Furthermore, the ZTO/Ti:ZTO TFTs exhibited enhanced bias-stress stability compared to the ZTO TFTs. We attribute the improved mobility and stability to the electron accumulation near the oxide channel heterointerface facilitated by band bending and defect passivation effect arising from the Ti:ZTO back-channel layer, respectively.

Effects of the remnant polarization on the electrical characteristics of steeper sub-threshold swing Fe-GeFinFET

In this article, a ferroelectric material is used in the gate stack of germanium FinFET to enhance the electrical performance of transistor, viz. subthreshold swing (SS), switching ratio (ION/IOFF), threshold voltage (Vth), transconductance (gm), and improve the short channel effects (SCEs). The extent of the improvement depends on the capacitance matching between the ferroelectric (FE) capacitance (Cferro) and baseline FinFET capacitance (Cmos). The variation of ferroelectric parameters like ferrothickness (tferro) and remnant polarization (Pr) on electrical characteristics of ferro-germanium FinFET (Fe-GeFinFET) have been investigated. The non-linear relationship between Cferro and Cmos over a voltage range circumvents the acceptable capacitance congruence between the two capacitances. With the incorporation of FE layer, the SS has been obtained as 8 mV/decade and the ION enhanced by 12 %. The device yields a transconductance (gm) of 20 mS at Vgs = Vds = 0.7 V. The results have been investigated using Sentaurus 3-D TCAD simulations.

Analysis of biosensing performance of Trench Double Gate Junctionless Field Effect Transistor

Diversified biomolecules sensing is turning out to be the most promising area of research due to ever decreasing healthy lifestyle. Field effect transistorized biosensing approach puts its signature as label free, portable and also very careful pathway. In this present work a trench structured dielectric modulated double gate junction-less field effect transistor (TG-DMJLFET) is urbanized using SILVACO ATLAS simulator for label free detection of biomolecules. The developed structure has two vertically positioned gates in distinct trenches. For immobilizing biomolecules, two cavities are formed in the gate oxide region for dielectric modulation. The dielectric constant (k) has been varied over a wide range of 1.54 (Uricase) to 12(Gelatin) signifying the sensing of diverse charged biomolecules. The sensitivity is evaluated in terms of threshold voltage shift and  transconductance . The in-depth electrostatic analysis is illustrated in terms of central potential ,energy band diagram ,drive current and also by the depiction of the electric field .In case of  charged biomolecules, the shift in threshold voltage is obtained as 350 mV for change in the di-electric constant (k) ranging from 1.54 to 12. The transconductance alteration is observed as 1.94×10-5 when the k is changed from 3.46 to 12 .The device has showed excellent performance in biomolecules sensing.

Electrical Properties of Electrochemically Exfoliated 2D Transition Metal Dichalcogenides Transistors for Complementary Metal‐Oxide‐Semiconductor Electronics

AbstractThe unique semiconducting characteristics of 2D materials, such as transition metal dichalcogenides (TMDs), have drawn significant interest in the field of electronic devices. However, the dependence of the device performance on the electrical properties of electrochemically exfoliated TMD nanoflakes remains unclear. In this study, the intrinsic electrical properties of diverse electrochemically exfoliated TMD nanoflakes are investigated and their applications in fully solution‐processed 2D electronics are explored. The study reveals that MoSe2 and WS2 nanoflakes are suitable candidates with moderate electron concentrations of 5.7 × 1012 and 2.5 × 1012 cm−2, respectively. These moderate electron concentrations enable a low off‐state current and high on‐state current, leading to a large on–off ratio (> 106) for the fabricated transistors. Furthermore, moderate annealing can increase the mobility by one order of magnitude by reducing the contact resistance and improving charge transport. Additionally, the trap density is significantly reduced, leading to an improved stability. Finally, fully solution‐processed 2D complementary inverters with a high voltage gain of 60 are demonstrated. This study contributes to a growing understanding of the properties of 2D materials in terms of transistor performances and promotes the development of solution‐processed devices applicable in next‐generation electronics.

Amine‐ and Polyethylene glycol‐Functionalized Pyrediyne Quantum Dots for Bioimaging Applications

AbstractPyrediyne, a recent addition to the 2D organic nanomaterials family, is known for its improved electrical conductivity, which can have potential applications in the performance of thin film transistors, field effect transistors, and charge storage devices. It has been shown that similar to carbon quantum dots, pyrediyne quantum dots (PDYQDs) can also be generated from 2D pyrediyne nanosheets and can be utilized for imaging cancer cells. In this context, it is highly desirable to enhance the photoluminescence properties of PDYQDs in order to improve the quality of quantum dots‐based cell imaging techniques. Herein, PDYQDs are effectively functionalized using aqueous functionalization agents such as NH3, PEG200, and PEG20000 via a simple and cost‐effective methodology, which resulted in a significant enhancement in the emission quantum yield (QY) (up to 30.2 %) through effectively reducing the non‐radiative recombination centers. After confirming their cytocompatibility using in vitro studies, the amine‐functionalized PDYQDs were utilized for imaging L929 mouse fibroblast cells. The findings in the present study suggest that it is worth exploring various surface functionalization techniques to enhance the applications of novel carbon‐based nano‐structures in various biological and optoelectronic devices.

Investigation of thermal stress effects on subthreshold conduction in nanoscale p-FinFET from Multiphysics perspective

The rising temperature due to a self-heating or thermal environment not only degrades the subthreshold performance but also intensifies thermal stress, posing a severe challenge to device performance and reliability design. The thermal stress effects on the ON-state performance of the p-type fin field-effect transistor were previously studied. However, as far as we know, how thermal stress affects its subthreshold conduction remains unclear, which is studied in this manuscript. The impact of thermal stress due to the self-heating of adjacent devices on subthreshold conduction is investigated by solving the quantum transport, thermal conduction, and force balance equations for ballistic transport and dissipative transport with phonon scattering. Then, the thermal stress effects at different ambient temperatures are further discussed and analyzed. The simulation results show that the OFF-state leakage current can be reduced by thermal stress, even up to 9.28% for the (110)/[001] device operating at an ambient temperature of 550 K, and its reduction is the comprehensive result of the thermal stress effects on the band structure, potential profile, carrier distribution, and source-to-drain tunneling. In addition, the thermal stress has no significant effects on subthreshold swing although it can change the magnitude of the subthreshold current. Moreover, the effect of thermal stress on subthreshold conduction is highly dependent on the thermal environment of the device and the crystal orientation of the channel semiconductor material.

Detailed Investigation of Plasticized PMMA Dielectric for Improved Performance of Organic Field-Effect Transistors

Detailed Investigation of Plasticized PMMA Dielectric for Improved Performance of Organic Field-Effect Transistors